High-purity tetraethyl orthosilicate (TEOS) is widely used in chemical vapor deposition processes in semiconductor manufacturing to form silicon dioxide films, creating conductive or insulating layers, creating anti-reflective coatings to increase light absorption, and temporarily blocking etching, thereby preventing contaminants and impurities from entering semiconductor components. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.