High-purity hydrogen chloride plays a key role in the surface cleaning of silicon wafers in the semiconductor industry, high-temperature vapor etching and third-generation compound semiconductors, doping and etching in chemical vapor deposition, equipment cleaning of large silica-based deposits in CVD or etching reaction chambers, and stripping of photoresist residues. This product has the advantages of ultra-high purity, which can meet the requirements of customers for a variety of packaging and cylinder joints.