High-purity chlorine is a key gas in the semiconductor process, with strong oxidation and high reactivity, mainly used for dry etching such as silicon and polysilicon etching, metal etching, compound semiconductor etching, thin film deposition such as silicon epitaxial growth and silicon nitride deposition, and cavity cleaning of silicon/metal deposits in CVD or etching light body. This product has the advantages of ultra-high purity, which can meet the requirements of customers for a variety of packaging and cylinder joints.