Semiconductor Wafer Fabrication

Fluorine/Nitrogen Mixture (F2/N2)

Grade: F2:3N
Packaging Specifications:47L cylinder, 50L cylinder
Specifications
Detailed Introduction
Product Introduction Page: Main Applications: Etching processes in semiconductor wafer fabrication
Fluorine/nitrogen mixtures are mainly used in semiconductor manufacturing for processes like dry etching and chamber cleaning, offering advantages such as high selectivity and low contamination. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.
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