High-purity silane is the most critical silicon source gas in semiconductor manufacturing. It plays a key role in thin film deposition processes such as polysilicon deposition, single-crystal silicon epitaxy, and amorphous silicon films; deposition of dielectric layers such as silicon nitride and silicon dioxide; and advanced process nodes such as contact hole filling and polysilicon deposition for 3D NAND channel holes. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.